Silicon wafer storage water and silicon wafer storage method

Details Silicon wafer storage water and silicon wafer storage method Silicon wafer storage water and silicon wafer storage method

2005-04-26

2005-04-26

McKane, Elizabeth (Department: 1744)

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

C438S692000, C134S002000

Reexamination Certificate

active

06884721

ABSTRACT:
Storage water used for storage of a silicon wafer in water is disclosed. The storage water contains Cu at a concentration of 0.01 ppb or less. A method of storing a silicon wafer in water is also disclosed. In the method, water containing Cu at a concentration of 0.01 ppb or less is used. In another method, a wafer is stored in water or a chemical solution, to which a chelating agent is added. The storage water and the storage methods can prevent degradation of oxide dielectric breakdown voltage which would otherwise occur due to Cu contamination from the storage water.

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