Silicon tip field emission cathode arrays and fabrication thereo

Details Silicon tip field emission cathode arrays and fabrication thereo Silicon tip field emission cathode arrays and fabrication thereo

1991-12-09

1993-04-06

Seidel, Richard K.

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

445 50, 313336, 313351, H01J 904

Patent

active

051999170

ABSTRACT:
Through a silicon fabrication process, an emitter tip array is produced by electron beam or other suitable submicrometer scale lithography for precise location of the emitters. The emitter tips are formed by an oxidation process which ensures accurate and precise formation of tips having uniform radii. The process also utilizes the oxidation step to precisely align gate electrode apertures with respect to corresponding emitter tips so that large arrays can be formed with great accuracy and reliability.

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