Silicon substrate cleaning method and apparatus

Details Silicon substrate cleaning method and apparatus Silicon substrate cleaning method and apparatus

1996-01-11

1998-04-07

Warden, Jill

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 13, 134 2, 134 31, B08B 700

Patent

active

057359628

ABSTRACT:
A silicon substrate cleaning method and apparatus is presented in which a hydrous cleaning solution is caused to evaporate at a temperature at about or above its azeotropic temperature and a cleaning vapor thus produced is applied to a substrate to remove unwanted oxide. This method can be applied to a series of silicon substrates with consistent results, substrate to substrate, despite the azeotropic temperature characteristics of the hydrous cleaning solution. The method produces an oxide-free substrate without contaminants, particulates or residue.

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