Silicon polishing solution preparation

Details Silicon polishing solution preparation Silicon polishing solution preparation

1973-12-28

1976-01-06

Hayes, Lorenzo B.

Compositions: coating or plastic

Coating or plastic compositions

Polishes

134 3, 156 4, 2041291, 20412975, 252 792, 252 793, 427309, C09K 1304

Patent

active

039308707

ABSTRACT:
An improved process for preparing a polishing solution for use in the chemical-mechanical polishing of silicon comprising copper nitrate, ammonium fluoride, nitric acid and ammonium nitrate. The latter two components are added to the copper nitrate, the system mixed well and then the ammonium fluoride added. The process eliminates the need for settling, decantation or filtration during solution preparation and permits substantially lowered amounts of copper nitrate to be used for silicon polishing. The silicon polishing solution is also described.

REFERENCES:
patent: 2410322 (1946-10-01), Weesner et al.
patent: 2588253 (1952-03-01), Lark-Horovitz et al.
patent: 2814589 (1959-11-01), Waltz
patent: 3088889 (1963-05-01), Boda et al.
patent: 3155556 (1964-11-01), Neunzig
patent: 3436259 (1969-04-01), Regh et al.

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