Silicon particles, silicon particle superlattice and method...

Chemistry of inorganic compounds – Silicon or compound thereof

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C423S337000, C423S348000, C423S349000

Reexamination Certificate

active

07850938

ABSTRACT:
A production method, comprising a step of synthesizing silicon particle-containing silicon oxide particles by performing a gas phase reaction of monosilane gas and oxidizing gas for oxidizing the monosilane gas and a step of removing the silicon oxide with hydrofluoric acid after holding the silicon oxide particle powder in an inert atmosphere at 800-1400°, provides high-purity silicon nanoparticles which are highly practical as material powder for high-performance light-emitting elements and electronic parts in an industrial scale.

REFERENCES:
patent: 5298296 (1994-03-01), Kojima et al.
patent: 7001579 (2006-02-01), Metzger et al.
patent: 7553466 (2009-06-01), Herold et al.
patent: 7632478 (2009-12-01), Poepken et al.
patent: 05-062911 (1993-03-01), None
patent: 6-72705 (1994-03-01), None
patent: 6-279015 (1994-10-01), None
patent: 06-349744 (1994-12-01), None
patent: 11-130867 (1999-05-01), None
patent: 2002-154817 (2002-05-01), None
patent: 2002-279704 (2002-09-01), None
patent: 2003-089896 (2003-03-01), None
patent: 2003-515459 (2003-05-01), None
patent: WO-03/026017 (2003-03-01), None
JP 06-279,015, 1994.
JP 2002-154,817, 2002.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Silicon particles, silicon particle superlattice and method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silicon particles, silicon particle superlattice and method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon particles, silicon particle superlattice and method... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4167018

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.