Silicon oxide particles

Stock material or miscellaneous articles – Coated or structually defined flake – particle – cell – strand,... – Particulate matter

Reexamination Certificate

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C510S167000, C423S325000, C051S309000

Reexamination Certificate

active

06726990

ABSTRACT:

FIELD OF THE INVENTION
The invention relates to silicon oxide particles having small particle diameters. The method further relates to method of producing the silicon oxide particles based on laser pyrolysis and polishing compositions including the silicon oxide particles.
BACKGROUND OF THE INVENTION
Technological advances have increased the demand for improved material processing with strict tolerances on processing parameters. In particular, smooth surfaces are required in a variety of applications in electronics, tool production and many other industries. The substrates requiring polishing can involve hard materials such as ceramics, glass and metal. As miniaturization continues even further, even more precise polishing will be required. Current submicron technology requires polishing accuracy on a nanometer scale. Precise polishing technology can employ mechanochemical polishing involving a polishing composition that acts by way of a chemical interaction of the substrate with the polishing agents as well as an abrasive effective for mechanical smoothing of the surface.
SUMMARY OF THE INVENTION
The invention features a collection of particles comprising amorphous silicon oxide having primary particles with an average diameter from about 5 nm to about 100 nm. The collection of silicon oxide particles effectively include no particles having a diameter greater than about four times the average diameter. In another aspect, the invention features a polishing composition including a dispersion of silicon oxide particles having an average primary particle diameter from about 5 nm to about 100 nm. The collection of silicon oxide particles in the dispersion effective includes no primary particles having a diameter greater than about four times the average diameter.
In another aspect, the invention features a method for processing a collection of silicon oxide particles having an average diameter from about 5 nm to about 1000 nm. The method includes heating the collection of particles comprising silicon oxide at a temperature from about 400° C. to about 800° C. In another aspect, the invention features a collection of particles comprising silicon oxide, the collection of particles having an average diameter from about 5 nm to about 1000 nm, the collection of particles being produced by forming particles comprising silicon oxide by laser pyrolysis and heating the particles produced by laser pyrolysis under an oxidizing atmosphere at a temperature from about 400° C. to about 800° C. for a sufficient period of time to decolorize the particles.


REFERENCES:
patent: 3954945 (1976-05-01), Lange et al.
patent: 4011099 (1977-03-01), Gutsche
patent: 4048290 (1977-09-01), Lee
patent: 4356107 (1982-10-01), Payne
patent: 4536252 (1985-08-01), McDonald et al.
patent: 4548798 (1985-10-01), Rice
patent: 4556416 (1985-12-01), Kamijo et al.
patent: 4558017 (1985-12-01), Gupta et al.
patent: 4705762 (1987-11-01), Ota et al.
patent: 4764497 (1988-08-01), Yuasa et al.
patent: 4775520 (1988-10-01), Unger et al.
patent: 4842837 (1989-06-01), Shimizu et al.
patent: 4910155 (1990-03-01), Cote et al.
patent: 4956313 (1990-09-01), Cote et al.
patent: 4959113 (1990-09-01), Roberts
patent: 4983650 (1991-01-01), Sasaki
patent: 5062936 (1991-11-01), Beaty et al.
patent: 5108732 (1992-04-01), Krumbe et al.
patent: 5128081 (1992-07-01), Siegel et al.
patent: 5169610 (1992-12-01), Yamada et al.
patent: 5228886 (1993-07-01), Zipperian
patent: 5352277 (1994-10-01), Sasaki
patent: 5480696 (1996-01-01), Harris et al.
patent: 5527423 (1996-06-01), Neville et al.
patent: 5580655 (1996-12-01), El-Shall et al.
patent: 5599511 (1997-02-01), Helble et al.
patent: 5605569 (1997-02-01), Boyer et al.
patent: 5626715 (1997-05-01), Rostoker
patent: 5635154 (1997-06-01), Arai et al.
patent: 5645736 (1997-07-01), Allman
patent: 5650017 (1997-07-01), Gorden et al.
patent: 5770022 (1998-06-01), Chang et al.
patent: 5801092 (1998-09-01), Ayers
patent: 5846310 (1998-12-01), Noguchi et al.
patent: 5871872 (1999-02-01), Matijevic et al.
patent: 5876490 (1999-03-01), Ronay
patent: 5876683 (1999-03-01), Glumac et al.
patent: 5891205 (1999-04-01), Picardi et al.
patent: WO 9524054 (1995-09-01), None
patent: WO 9851613 (1998-11-01), None
Ullmann's Encyclopedia of Industrial Chemistry (ed. Barbara Elvers, vol. A23, pp. 635-639, 1993).*
“Synthesis of Ultafine Si3N4Particles by CO2-Laser Induced Gas Phase Reactions” Peter R. Buerki et al. High Temperature Science, vol. 27 pp. 323-335 (1990).
“Material Synthesis by Laser Heating of Gases”, G.M. Rice et al. Spectrocimica Acta. vol. 43A. No. 2 pp. 299-300 (1987).
“Synthesis of Ultrafine Ceramic Powders by Means of CO2laser in a flow reactor”, R. Fantoni et al. SPIE vol. 1279 Laser-Asserted Processing, pp. 77-89 (1990).
“Sinterable Powders from Laser-Divison Reactions”, J.S. Hagerty et al. in Laser-Induced Chemical Processes, ed. by Jeffrey I. Steinfeld. Plenum Press, pp. 165-241 (1981).
“Ceramic Powders from Laser Driven Reactions”, John H. Flint et al. SPIE vol. 458 Applications of Lasers to Industrial Chemistry, pp. 108-113 (1984).
“Laser Synthesis of Vanadium-titanium Oxide Catalysts”, M. Musci. J. Mater. Res., vol. 7, No. 10. pp. 2846-2852 (Oct. 1992).
“Infrared Laer Generation of Heterogeneous Catalysts and Laser-induced Reactions at Catalytic Surfaces”, Wayne C. Danen. SPIE vol. 458 Applications of Lasers to Industrial Chemistry, pp. 124-130 (1984).
“Sinterable Ceramic Powders from Laser-Driven Reactions: II, Powder Characteristics and Process Variables”, W.R. Cannon et al. Journal of the American Ceramic Society vol. 65, No. 7 pp. 330-335 (Jul. 1982).
“Sinterable Ceramic Powders from Laser-Driven Reactions: I, Process Description and Modeling”, W.R. Cannon et al. Journal of the American Ceramic Society vol. 65, No. 7 pp. 324-330 (Jul. 1982).

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