Silicon oxide film growing apparatus

Details Silicon oxide film growing apparatus Silicon oxide film growing apparatus

1993-01-05

1994-12-27

Chaudhuri, Olik

Coating apparatus

Projection or spray type

Plural projectors

118320, 118421, 118423, 118429, 29 2501, B05C 300, B05B 100, B05B 700

Patent

active

053761766

ABSTRACT:
According to this invention, a silicon oxide film growing apparatus includes a single wafer film-forming processing tank, a post processing unit, and a wafer conveying robot. The single wafer film-forming processing tank selectively grows a silicon oxide film by a liquid-phase growing method on only a silicon oxide film on a surface of a semiconductor wafer. The post processing unit washes the surface of the semiconductor wafer. The wafer conveying robot conveys the semiconductor wafer between the film-forming processing tank and the post processing unit.

REFERENCES:
patent: 4917123 (1990-04-01), McConnell et al.
patent: 4971920 (1990-11-01), Miyashita et al.
patent: 5232511 (1993-08-01), Bergman

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