Silicon nozzle structures and method of manufacture

Fluid sprinkling – spraying – and diffusing – Rigid fluid confining distributor – Orifice shapes

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346 75, 156644, 156647, A62C 3102, G01D 1518

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active

047338237

ABSTRACT:
A nozzle structure in a crystallographically oriented, monocrystalline silicon includes a pyramidal opening anisotropically etched from the entrance side of the nozzle and truncated in a membrane having a smaller cross-section than the initial cross-section of the entrance opening. The membrane has extending therethrough a pyramidal opening etched anisotropically from the exit side. The vertical axes of both openings are substantially concentric.

REFERENCES:
patent: 3921916 (1975-11-01), Bassous
patent: 3949410 (1976-04-01), Bassous et al.
patent: 3958255 (1976-05-01), Chiou et al.
patent: 4007464 (1977-02-01), Bassous et al.
patent: 4014029 (1977-03-01), Lane et al.
patent: 4169008 (1979-09-01), Kurth
Leone et al., "Fabricating Shaped Grid and Aperture Holes", IBM Tech. Disclosure Bul., vol. 14, No. 2, pp. 417-418; 7-1971.
Kuan et al., "Two-Sided Groove Etching Method to Produce Silicon Ink Set Nozzles", IBM TDB, vol. 21, No. 6, pp. 2585-2586; 11-1978.

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