Silicon nitride vacuum furnace process

Chemistry of inorganic compounds – Silicon or compound thereof – Binary compound

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C01B 21068

Patent

active

049700570

ABSTRACT:
An improved process of preparing silicon nitride by the direct nitridation of silicon metal is disclosed. The process is a multi-step one which is substantially more efficient than prior processes and produces a silicon nitride having an oxygen content of less than 1%, a silicon metal content of less than 0.5%, and an alpha phase content of at least 85%, preferably at least 90%. The silicon nitride may be converted to a powder.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Silicon nitride vacuum furnace process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silicon nitride vacuum furnace process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon nitride vacuum furnace process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-775863

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.