Silicon nitride substrate, method of manufacturing the same,...

Details Silicon nitride substrate, method of manufacturing the same,... Silicon nitride substrate, method of manufacturing the same,...

2011-05-24

2011-05-24

Wilczewski, Mary (Department: 2822)

Active solid-state devices (e.g., transistors, solid-state diode

Housing or package

Insulating material

C257S705000, C257S706000, C257S712000, C438S718000, C174S13700R, C264S647000, C361S688000

Reexamination Certificate

active

07948075

ABSTRACT:
A silicon nitride substrate having appropriately adjusted warpage and surface roughness can be obtained by mixing magnesium oxide of 3 to 4 wt % and at least one kind of rare-earth element oxide of 2 to 5 wt % with silicon nitride source material powder to form a sheet-molded body, sintering the sheet-molded body, and performing a heat treatment at a temperature of 1,550 to 1,700 degree C. with a pressure of 0.5 to 6.0 kPa with a plurality of substrates being stacked. Also, a silicon nitride circuit board and a semiconductor module using the same are provided.

REFERENCES:
patent: 2006/0170306 (2006-08-01), Takahashi et al.
patent: 2009/0039477 (2009-02-01), Kaga et al.
patent: 1 142 849 (2001-10-01), None
patent: A-61-10069 (1986-01-01), None
patent: A-61-186257 (1986-08-01), None
patent: A-11-268958 (1999-10-01), None
patent: A-2001-19555 (2001-01-01), None
patent: A-2001-335359 (2001-12-01), None
patent: A-2002-12474 (2002-01-01), None
patent: A-2002-362976 (2002-12-01), None
patent: A-2004-161605 (2004-06-01), None
patent: WO 2006/118003 (2006-11-01), None
Jun. 4, 2009 Search Report issued in European Patent Application No. 09154697.8.

Affiliated with

Also associated with

Rating

Silicon nitride substrate, method of manufacturing the same,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silicon nitride substrate, method of manufacturing the same,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon nitride substrate, method of manufacturing the same,... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2689443