Silicon nitride coating compositions

Details Silicon nitride coating compositions Silicon nitride coating compositions

1999-09-21

2001-04-10

Jones, Deborah (Department: 1775)

Compositions: ceramic

Ceramic compositions

Glass compositions, compositions containing glass other than...

C428S325000, C428S428000, C428S432000, C428S469000, C428S472000, C428S697000, C428S698000, C428S699000, C428S704000, C428S901000, C252S512000, C252S514000, C252S518100, C252S519500, C252S521400, C252S521300, C501S011000, C501S053000, C501S055000

Reexamination Certificate

active

06214754

ABSTRACT:

STATEMENT REGARDING FEDERRALY SPONSORED RESEARCH OR DEVELOPMENT
N/A
BACKGROUND OF THE INVENTION
The present invention relates to compositions which are useful as dielectric or conductive coatings for substrates and which have been surprisingly found to be particularly adherent to silicon nitride substrates.
The electronics and electrical industries have placed increasing demands on substrates for transferring and dissipating larger and larger quantities of power. Dielectric and conductive coating materials are used in a growing number of applications, including under-the-hood automotive circuitry, surface-mounted components, hybrid circuit boards, multi-chip modules, and heaters, heat sensors and heat regulators in industrial and domestic applications. Silicon nitride (Si
3
N
4
) is a desirable substrate for use in such applications, but dielectric or conductive coatings presently available do not adhere well or stably to Si
3
N
4
, raising the need for new coatings that will be acceptable for this purpose.
BRIEF SUMMARY OF THE INVENTION
The present invention relates to useful thick film coating materials which may be applied to substrates, silicon nitride substrates in particular, so as to desirably enable their use in making apparatus such as heaters. Broadly, such thick film coating materials comprise a borosilicate glass matrix containing an amount of a metal oxide sufficient to enhance adherence to the silicon nitride substrate; and desirably further contain ceramic powders and/or metal or metal-containing compound powders and/or flakes.
In an embodiment, a thick film coating material in accordance herewith comprises a borosilicate glass matrix having 10 to 80% SiO
2
; 7 to 24% B
2
O
3
; 0 to 65% ZnO and 0 to 25% PbO, all percentages by total weight of the borosilicate glass. The disclosure is further directed towards silicon nitride substrates having applied thereto the thick film coating materials described herein, which may also further contain ceramic powders and/or metal or metal-containing compound powders and/or flakes.


REFERENCES:
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patent: 4857486 (1989-08-01), Ebata et al.
patent: 4861646 (1989-08-01), Barringer et al.
patent: 4906406 (1990-03-01), Hormadaly
patent: 4980086 (1990-12-01), Hiraiwa et al.
patent: 5236737 (1993-08-01), Linton
patent: 5376596 (1994-12-01), Toluda et al.
patent: 5468695 (1995-11-01), Carroll et al.
patent: 5480846 (1996-01-01), Sundberg et al.
patent: WO 93/06053 (1993-04-01), None

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