Compositions: ceramic – Ceramic compositions – Refractory
Patent
1992-04-22
1993-08-24
Group, Karl
Compositions: ceramic
Ceramic compositions
Refractory
501 98, C04B 3558
Patent
active
052388840
ABSTRACT:
A silicon nitride sintered body wherein a number of grain boundaries of Si.sub.3 N.sub.4 per a length of 10 .mu.m is not more than 20 when measured along a straight line drawn in an arbitrary section of the silicon nitride sintered body. A process is disclosed for producing such a silicon nitride sintered body, which includes the steps of grinding and mixing a raw material of silicon nitride and not more than 0.3 wt. % of Al when calculated as Al.sub.2 O.sub.3, shaping the mixture, and firing the shaped body. The silicon nitride sintered body involves not only ordinary silicon nitride sintered bodies, but also vapor deposited films of silicon nitride formed by CVD or the like, flame sprayed films of silicon nitride formed by flame spraying, and the like.
REFERENCES:
patent: 4608354 (1986-08-01), Avella et al.
patent: 4806510 (1989-02-01), Kanai et al.
patent: 4814301 (1989-03-01), Steinmann et al.
patent: 4845060 (1985-07-01), Wickel et al.
patent: 4883776 (1989-11-01), Pyzik et al.
patent: 4891342 (1990-01-01), Yokoyama
patent: 4980322 (1990-12-01), Wickel et al.
patent: 5017530 (1991-05-01), Arakawa et al.
patent: 5045513 (1991-09-01), Mizuno et al.
patent: 5096859 (1992-03-01), Sakai et al.
Ziegler et al., "Effect of Phase Composition and Microstructure On the Thermal Diffusivity of Silicon Nitride", J. of Mat. Science, 16 (1981) pp. 495-503.
Isomura Manabu
Sakai Hiroaki
Group Karl
NGK Insulators Ltd.
LandOfFree
Silicon nitride bodies and a process for producing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Silicon nitride bodies and a process for producing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon nitride bodies and a process for producing the same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-828968