Silicon micromachine with sacrificial pedestal

Details Silicon micromachine with sacrificial pedestal Silicon micromachine with sacrificial pedestal

1997-02-07

1999-07-06

Chapman, John E.

Measuring and testing

Speed, velocity, or acceleration

Acceleration determination utilizing inertial element

361280, G01P 15125

Patent

active

059200138

ABSTRACT:
A protective coating is utilized to protect the silicon during a wet chemical etch step in the process of making a micromachine, thereby preventing the formation of etched holes or pits in the micromachine. In another embodiment, silicon sacrificial pedestals are used to eliminate or greatly reduces the electrical potential difference between metal on the glass substrate and the silicon, thereby eliminating arcing and the resulting damage to silicon and metal. These pedestals may be removed after the anodic bond.

REFERENCES:
patent: 4384899 (1983-05-01), Myers
patent: 4483194 (1984-11-01), Rudolf
patent: 4598585 (1986-07-01), Boxenhorn
patent: 4736629 (1988-04-01), Cole
patent: 5220835 (1993-06-01), Stephan
patent: 5404749 (1995-04-01), Spangler
patent: 5446616 (1995-08-01), Warren
patent: 5488864 (1996-02-01), Stephan

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