Silicon microlens cleaning system

Electrolysis: processes – compositions used therein – and methods – Electrolytic material treatment – Solid

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205687, 250396R, 250397, 219600, 373166, H01J 3726

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active

060774177

ABSTRACT:
A method and system for cleaning the silicon microlenses in an electron-beam microcolumn in situ. The microlenses individually are heated by passing a current through each microlens. The current is utilized to heat the microlens to at least two hundred degrees Centigrade to prevent contamination and occasionally to a temperature on the order of six to seven hundred degrees Centigrade to remove any builtup or potential contamination.

REFERENCES:
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patent: 5155412 (1992-10-01), Chang et al.
patent: 5451303 (1995-09-01), Heiler et al.
Chang, T.H.P. et al., "Electron Beam Sources and Charged-Particle Optics", SPIE vol. 2522, pp. 4-12 (1995). no month.
Chang, T.H.P. et al., "Electron-beam Microcolumns for Lithography and Related Applications", J. Vac. Sci. Technol. B 14(6), pp. 3774-3781 (1996). no month.
Chang, T.H.P. et al., "Electron Beam Technology--SEM to microcolumn", Microelectronic Engineering, 32: pp. 113-130 (1996). no month.
Kim, H.S. et al., "Miniature Schottky Electron Source", J. Vac. Sci. Technol. B 13(6), pp. 2468-2472 (1995). no month.
Kratschmer, E. et al., "Experimental Evaluation of a 20 .times. 20 mm Footprint Microcolumn", J. Vac. Sci. Technol. , B 14(6), pp. 3792-3796 (1996). no month.
Lee, K.Y., "High Aspect Ratio Aligned Multilayer Microstructure Fabrication", J. Vac. Sci. Technol., B 12(6), pp. 3425-3430 (1994). no month.
Thomson, M.G.R. et al., "Lens And Deflector Design For Microcolumns", J. Vac. Sci. Technol., B 13(6) pp. 2445-2449 (1995). no month.

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