Silicon membrane and method of making same

Details Silicon membrane and method of making same Silicon membrane and method of making same

1995-08-15

1997-09-30

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430313, 430314, 1566281, 1566431, 1566571, 1566621, G03F 900

Patent

active

056724497

ABSTRACT:
A silicon membrane for use as a micromechanical sensor or as a mask for projection lithography is fabricated by doping a silicon wafer to different thicknesses at different portions and then electrochemically etching away the undoped portion of the wafer.

REFERENCES:
patent: 4256532 (1981-03-01), Magdo
patent: 4647517 (1987-03-01), Hersener et al.
patent: 4751169 (1988-06-01), Behringer
Silicon Cantilever Beams Fabricated by Electrochemically Controlled Etching for Sensor Applications, 1046 Journal of Electrochemical Society, Aug. 1986, P.M. Sarro et al.
1046b Extended Abstracts, vol. 81-1, May 1982, 2 pages.
Feng SHI, Kassel Jun. 1994, "Nasschemische Atzprozesse Zur Mikrostrukturierung Des Siliziums Fur Die Mikromechanik" pp. 1-102 & (4 intro pages).
B.S.T.J. Brief, "Electrochemically Controlled Thinning of Silicon".H.A.Waggener, pp. 473-475 Mar. 1970.

Affiliated with

Also associated with

Rating

Silicon membrane and method of making same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silicon membrane and method of making same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon membrane and method of making same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2255711