Silicon film deposition from mixture of silanes

Details Silicon film deposition from mixture of silanes Silicon film deposition from mixture of silanes

1986-05-27

1988-01-26

Goodrow, John L.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Process of making radiation-sensitive product

430 85, G03G 5085

Patent

active

047216646

ABSTRACT:
A process for producing a photoconductive member comprises forming a photoconductive layer on a substrate for formation of a photoconductive layer by introducing starting substances for formation of a photoconductive layer under gaseous state into a deposition chamber maintained under a desired reduced pressure and exciting discharging under the gas atmosphere of said starting substances, characterized in that said starting substances are constituted of at least two compunds selected from the group consisting of the compounds of the formula:

REFERENCES:
patent: 4196438 (1980-04-01), Carlson
patent: 4202928 (1980-05-01), Staebler
patent: 4226643 (1980-10-01), Carlson
patent: 4226898 (1980-10-01), Ovshinsky et al.
patent: 4265991 (1981-05-01), Hirai et al.
patent: 4292343 (1981-09-01), Plaettner et al.
patent: 4356246 (1982-10-01), Tabei et al.
patent: 4363828 (1982-12-01), Brodsky et al.

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