Silicon etching process for making microchannel plates

Details Silicon etching process for making microchannel plates Silicon etching process for making microchannel plates

1998-05-08

1999-12-07

Nuzzolillo, Maria

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Coating selected area

205219, 205221, 205223, 205656, 205665, 205674, 205675, C25D 534, C25D 548, C25D 906, C25F 312

Patent

active

059977132

ABSTRACT:
An element with elongated, high aspect ratio channels such as microchannel plate is fabricated by electrochemical etching of a p-type silicon element in a electrolyte to form channels extending through the element. The electrolyte may be an aqueous electrolyte. For use as a microchannel plate, the; the silicon surfaces of the channels can be converted to insulating silicon dioxide, and a dynode material with a high electron emissivity can be deposited onto the insulating surfaces of the channels. New dynode materials are also disclosed.

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