Silicon double-injection electro-optic modulator with insulated-

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350 9613, 350 9611, 350 9612, 350320, 357 19, 357 20, 357 234, 357 2312, 357 2314, 357 30, G02B 610, H01L 2906

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active

049588982

ABSTRACT:
A double-injection transistor structure with an MOS gate is utilized as a guided-wave electro-optic phase modulator at infrared wavelengths in a silicon-on-insulator (SOI) waveguide. Cathode, gate and anode regions are integrated in the waveguide, longitudinally. The effective phase modulation is given by the voltage-variable overlap of the guided-mode optical field with carrier-induced local changes in the silicon refractive index. An electron-hole plasma is injected under the gate by cathode and anode. Using depletion-layer widening, the plasma channel width and mode overlap are controlled very rapidly by one or two low-power gate electrodes.

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