Silicon crystallization using self-assembled monolayers

Details Silicon crystallization using self-assembled monolayers Silicon crystallization using self-assembled monolayers

2006-07-04

2006-07-04

Tran, Thien F. (Department: 2811)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S150000, C438S166000, C438S488000

Reexamination Certificate

active

07071022

ABSTRACT:
A display device comprises a substrate having a layer of crystalline or polycrystalline semiconductor material disposed over the substrate, wherein the substrate has a strain point that is lower than a forming temperature of the layer. The crystalline or polycrystalline material is fabricated by a method that includes providing a self-assembled monolayer (SAM) over the substrate, depositing a layer of material over the SAM, and substantially crystallizing the layer.

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