Silicon-containing polymer, resist composition and...

Details Silicon-containing polymer, resist composition and... Silicon-containing polymer, resist composition and...

2005-06-07

2005-06-07

Peng, Kuo-Liang (Department: 1712)

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

C526S279000

Reexamination Certificate

active

06902772

ABSTRACT:
Silicon-containing polymers comprising recurring units of three components represented by the general formula (1) are novel wherein R1, R2and R3are hydrogen or C1-10alkyl, R4, R5and R6are hydrogen, C1-20alkyl or haloalkyl, or C6-20aryl, R7is C4-20alkyl, n is 1 to 5, p, q and r are positive numbers. Resist compositions comprising the polymers are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of less than 300 nm and improved resistance to oxygen plasma etching

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