Silicon-containing polyamic acid derivative and photosensitive r

Details Silicon-containing polyamic acid derivative and photosensitive r Silicon-containing polyamic acid derivative and photosensitive r

1994-04-19

1995-09-12

Berman, Susan W.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

522164, 528 25, 528 26, 528 35, 430270, 430283, 430906, G03F 7075, C08G 7310, C08G 7706, C08L 7706

Patent

active

054497051

ABSTRACT:
The present invention provides a silicon-containing polyamic acid derivative which is represented by the formula (VI) ##STR1## and which has a logarithmic viscosity number of 0.1 to 5.0 dl/g at 30.degree. C. in N-methyl-2-pyrrolidone, said silicon-containing polyamic acid derivative being obtained by reacting A mol of a tetracarboxylic acid derivative, B mol of a diamine, and C mol of an aminosilicon compound so as to meet the relations of the equations (IV) and (V): ##EQU1## A photosensitive resin composition using this silicon-containing polyamic acid derivative can be easily manufactured, permits the formation of a negative type sharp relief pattern, can inhibit film reduction at the time of curing by baking, and is excellent in adhesive properties to substrates, heat stability and shelf stability.

REFERENCES:
patent: 3893811 (1975-07-01), Good et al.
patent: 3950308 (1976-04-01), Greber et al.
patent: 5055549 (1991-10-01), Maeda et al.
patent: 5071908 (1991-12-01), Kunimune et al.
patent: 5187241 (1993-02-01), Buchwalter et al.
Buhr et al, "Non-Ionic Photoacid Generating Compounds", Polymeric Materials: Science and Engineering, vol. 61, pp. 269-277, 1989.

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