Silicon-containing deposited film

Details Silicon-containing deposited film Silicon-containing deposited film

1995-06-07

1997-07-08

King, Roy V.

Stock material or miscellaneous articles

Composite

Of inorganic material

430 62, 430 63, 430133, 427578, B32B 900, G03G 504

Patent

active

056459475

ABSTRACT:
A deposition film is formed on a substrate in a deposition space (A) by the chemical reaction between a gaseous precursor of a higher silicon halide or a higher halosilane formed in a decomposition space (B) and a separately-introduced gaseous, activated species of hydrogen, silane or a halosilane formed in a decomposition space (C).

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