Catalyst – solid sorbent – or support therefor: product or process – Catalyst or precursor therefor – Boron or compound containing same
Reexamination Certificate
2007-08-07
2007-08-07
Wood, Elizabeth D. (Department: 1755)
Catalyst, solid sorbent, or support therefor: product or process
Catalyst or precursor therefor
Boron or compound containing same
C502S211000, C502S210000, C502S254000, C502S256000, C502S240000, C502S263000, C502S439000, C502S208000, C502S214000
Reexamination Certificate
active
11069034
ABSTRACT:
A silicon-containing alumina support, a process for preparing the support, and a catalyst containing the support are provided. The alumina support includes an additive silicon enriched on its surface, with the difference between the atomic ratio of silicon to aluminum on the surface of alumina support and that of the alumina support is at least 0.10. The process for preparing the silicon-containing alumina support comprises adding a nanometer silicon compound. The inventive alumina support can be used in manufacturing a catalyst for hydrotreating hydrocarbons with good physico-chemical properties and performance.
REFERENCES:
patent: 4758544 (1988-07-01), Plesko et al.
patent: 5401388 (1995-03-01), Schmidt et al.
patent: 5498810 (1996-03-01), Bogdan et al.
patent: 5831139 (1998-11-01), Schmidt et al.
patent: 1086534 (1994-05-01), None
patent: 1141821 (1997-02-01), None
Peng Shaozhong
Wei Dengling
China Petroleum & Chemical Corporation
Cohen Pontani Lieberman & Pavane LLP
Fushun Research Institute of Petroleum and Petroch
Wood Elizabeth D.
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