Coating processes – Direct application of electrical – magnetic – wave – or... – Chemical vapor deposition
Patent
1992-10-20
1995-04-11
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Chemical vapor deposition
427237, 427239, 4272481, 427591, 427598, B05D 314
Patent
active
054056586
ABSTRACT:
This invention relates to an improved process for the thermal dehydrogenation of polysilicon granules in a fluidized bed reactor, the improvement which comprises introducing a varying electromagnetic field into the reactor whereby reactor walls are coated with silicon during the dehydrogenation.
REFERENCES:
patent: 4292344 (1981-09-01), McHale
patent: 4668493 (1987-05-01), Levin
patent: 4684513 (1987-08-01), Iya
patent: 4748052 (1988-05-01), Allen
patent: 4751067 (1988-06-01), Levin
patent: 4784840 (1988-11-01), Gautreaux et al.
patent: 4868013 (1989-09-01), Allen
patent: 4883687 (1989-11-01), Gautreaux et al.
patent: 4981102 (1991-01-01), Gautreaux et al.
patent: 5041308 (1991-08-01), Kuramoto
Clary David W.
Farritor Robert E.
Ibrahim Jameel
Albemarle Corporation
Pianalto Bernard
Spielman, Jr. E. E.
LandOfFree
Silicon coating process does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Silicon coating process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon coating process will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1537124