Compositions – Gaseous compositions – Carbon-oxide and hydrogen containing
Reexamination Certificate
2006-03-07
2006-03-07
Langel, Wayne A. (Department: 1754)
Compositions
Gaseous compositions
Carbon-oxide and hydrogen containing
C502S178000
Reexamination Certificate
active
07008560
ABSTRACT:
A method for converting light hydrocarbons (e.g. methane or natural gas) to synthesis gas employs a silicon carbide-supported catalyst that catalyzes a net partial oxidation reaction. Certain preferred catalysts include a catalytically active metal disposed on a silicon carbide support.
REFERENCES:
patent: 3850844 (1974-11-01), Takeo et al.
patent: 4758375 (1988-07-01), Brophy et al.
patent: 4914070 (1990-04-01), Ledoux et al.
patent: 4940684 (1990-07-01), Okutani et al.
patent: 5792719 (1998-08-01), Eberle et al.
patent: 5980843 (1999-11-01), Silversand
patent: 6087545 (2000-07-01), Choudhary et al.
patent: 6184178 (2001-02-01), Balauais et al.
patent: 6211255 (2001-04-01), Schanke et al.
patent: 6254807 (2001-07-01), Schmidt et al.
patent: 6402989 (2002-06-01), Gaffney
patent: 6409940 (2002-06-01), Gaffney et al.
patent: 2003/0009943 (2003-01-01), Millet et al.
patent: WO00 62926 (2000-10-01), None
PCT International Search Report for Application No. PCT/US04/03705, dated Aug. 5, 2004 (3 p.).
Deutschmann et al.,Natural Gas Conversion in Monolithic Catalysts: Interaction of Chemical Reactions and Transport Phenomena, Studies in Surface Science and Catalysis (2001) pp. 251-258, no month.
Jiang Yi
Minahan David M.
Ramani Sriram
Conley & Rose, P.C.
ConocoPhillips Company
Langel Wayne A.
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