Silicon carbide ceramic components having oxide layer

Details Silicon carbide ceramic components having oxide layer Silicon carbide ceramic components having oxide layer

2004-04-30

2008-11-18

Turner, Archene (Department: 1794)

Stock material or miscellaneous articles

Composite

Of quartz or glass

C428S304400, C428S312200, C428S312600, C428S318400, C428S319100, C428S325000, C428S428000, C428S698000, C428S701000, C428S702000

Reexamination Certificate

active

07452606

ABSTRACT:
A ceramic component is provided, including a ceramic body containing silicon carbide, and an oxide layer provided on the ceramic body, the oxide layer being formed by oxidizing the ceramic body in the presence of alumina and boron.

REFERENCES:
patent: 2609318 (1952-09-01), Swentzel
patent: 3394028 (1968-07-01), Parr et al.
patent: 3811928 (1974-05-01), Henney et al.
patent: 4140645 (1979-02-01), Beall et al.
patent: 4499147 (1985-02-01), Enomoto et al.
patent: 4567103 (1986-01-01), Sara
patent: 4613522 (1986-09-01), Vasilos
patent: 4664946 (1987-05-01), Enomoto et al.
patent: 4839316 (1989-06-01), Tiegs
patent: 4990469 (1991-02-01), Dussaulx et al.
patent: 6143239 (2000-11-01), Sonntag
patent: 6331362 (2001-12-01), Dupel et al.
patent: 6347446 (2002-02-01), Luthra et al.
patent: 6759117 (2004-07-01), Bauer et al.
patent: 2002/0136835 (2002-09-01), Li et al.
patent: 294 703 (1991-10-01), None
patent: 0 393 332 (1990-10-01), None
patent: 0 718 254 (1996-06-01), None
patent: 1 264 807 (2002-12-01), None
patent: 56 103339 (1981-08-01), None
patent: 59 227787 (1984-12-01), None
patent: 62-030681 (1987-02-01), None
patent: 07 206556 (1995-08-01), None
patent: 1530623 (1989-12-01), None
patent: 1806119 (1993-03-01), None
Xie et al “Formation of silicon nitride bonded silicon carbide by aqueous glecasting” Materials Science & Eng A349 (2003) 20 28.
“High Temperature Oxidation of Porous Non-Oxide Ceramics: Recent Advances in Modelling and Protection by Coatings,” J. Desmaison, Laboratorie de Materiaux Ceramiques et Traitements de Surface, Corrosion of Advanced Ceramics, pp. 309-327, 1994.
“Effect of Glass Sealing on the Oxidation Behavior of Three Dimensional C/SiC Compisties in Air,” Laifei Cheng, et al., Elsevier Science Ltd., PII: S0008-6223(00)00148-2, pp. 1127-1133, 2001.
“Glass Coating for SiC/SiC Composites for High-Temperature Application,” M. Ferraris, et al., Acta Metallurgica, Inc., Elsevier Science Ltd., PII S1359-6454(00)00263-9, pp. 4721-4724, 2000.
“Ceramic Coatings for Carbon-Carbon Composites,” James. R. Strife, et al., United Technologies Research Center, Ceramic Bulletin, vol. 67, No. 2, pp. 369-374, 1988.
“Effect of Alumina Particle Size on Prevention of Crystal Growth in Low-k Silica Dielectric Composite,” Jau-Ho Jean, et al., Materials Chemistry and Physics 40, pp. 50-55, 1995.
“Devitrification Inhibitor in Binary Borosilicate Glass Composite,” Jau-Ho Jean, et al., Alcoa Electronic Packaging, Inc., J. Mater. Res., vol. 8, No. 2, pp. 356-363, 1993.
“Devitrification Inhibitors In Borosilicate Glass and Binary Borosilicate Glass Composite” Jau-Ho Jean, Department of Materials Science and Engineering, National Tsing Hua University, J. Mater. Res., vol. 10, No. 5, pp. 1312-1320, 1995.
“Effects of Alumina Addition on Crystillization of Borosilicate Glass,” Yoshihiki Imanaka, et al., Fujitsu Laboriatories, Ltd., J. Ceram. Soc. Jpn. Inter. Ed. vol. 97, pp. 301-305, 1989.
“Silicon Carbide Sinters Having Erosion-Resistant Protective Layers”, Chemical Abstracts, vol. 102, No. 20, 1985, Columbus, OH.
Zhang, “The Production and use of the Si3N4-SiC Material”, Shandong Ceramic. Mar. 1999, pp. 11-17.

Affiliated with

Also associated with

Rating

Silicon carbide ceramic components having oxide layer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silicon carbide ceramic components having oxide layer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon carbide ceramic components having oxide layer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4036999