Silicon carbide carrier for wafer processing in vertical furnace

Details Silicon carbide carrier for wafer processing in vertical furnace Silicon carbide carrier for wafer processing in vertical furnace

1994-11-22

1995-08-22

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118500, 432253, C23C 1600

Patent

active

054436494

ABSTRACT:
A single piece, high purity, full density semiconductor wafer holding fixture for holding a multiplicity of wafers and consisting essentially of chemical vapor deposited silicon carbide (CVD SiC). The wafer carrier is advantageous for the fabrication of electronic integrated circuits in a vertical furnace, where high temperatures and/or corrosive chemicals are present, where dimensional stability of the holder is advantageous to the process, and where introduction of contaminating elements is deleterious to the process. The method for making such an article comprises shaping a substrate, e.g. graphite, which on one surface has the form of the desired shape, said form comprising raised longitudinal sections to support the silicon wafers at the edges of the wafers, chemically vapor depositing a layer of silicon carbide onto the substrate, removing the substrate intact or by burning, machining, grinding, gritblasting and/or dissolving, and grinding the silicon carbide in any areas where a more precise dimension is required.

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patent: 5283089 (1994-02-01), Bates

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