Silicon carbide and other films and method of deposition

Details Silicon carbide and other films and method of deposition Silicon carbide and other films and method of deposition

2007-08-28

2007-08-28

Turner, Archene (Department: 1775)

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

C427S249100, C427S249150, C427S255170, C427S255230, C427S255390

Reexamination Certificate

active

10716006

ABSTRACT:
A method of depositing a ceramic film, particularly a silicon carbide film, on a substrate is disclosed in which the residual stress, residual stress gradient, and resistivity are controlled. Also disclosed are substrates having a deposited film with these controlled properties and devices, particularly MEMS and NEMS devices, having substrates with films having these properties.

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