Silica sol compositions for polishing silicon wafers

Details Silica sol compositions for polishing silicon wafers Silica sol compositions for polishing silicon wafers

1982-06-21

1984-07-31

Schmidt, Frederick R.

Abrasive tool making process, material, or composition

Impregnating or coating an abrasive tool

51308, 106 3, 252544, 252547, 252155, B24B 100

Patent

active

044621884

ABSTRACT:
Semi-conductors can be polished with greater efficiency using as a polishing agent a blend of colloidal silica or silica gel, a water-soluble amine and a water-soluble quaternary ammonium salt or base.

REFERENCES:
patent: 2060850 (1936-11-01), Calcott
patent: 3146208 (1964-08-01), Fisher et al.
patent: 3170273 (1965-02-01), Walsh et al.
patent: 3715842 (1973-02-01), Tredinnick et al.
patent: 3807979 (1974-04-01), Cromwell
patent: 3925229 (1975-12-01), Bolsing
patent: 4129457 (1978-12-01), Basi
patent: 4169337 (1979-10-01), Payne

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