Silica layers and antireflection film using same

Details Silica layers and antireflection film using same Silica layers and antireflection film using same

2005-01-04

2005-01-04

Stein, Stephen (Department: 1775)

Stock material or miscellaneous articles

Composite

Of inorganic material

C428S432000, C428S446000, C428S448000, C428S212000

Reexamination Certificate

active

06838197

ABSTRACT:
A silica layer is provided which is usable as a low refractive index layer undergoing no change in its refractive index. Further, a silica layer is provided which is highly productive and usable as a medium or high refractive index layer undergoing neither reduction in transmittance nor change in spectral colors. Still further, an antireflection film using these silica layers is provided.

REFERENCES:
patent: 5530581 (1996-06-01), Cogan
patent: 6068914 (2000-05-01), Boire et al.
patent: 6165598 (2000-12-01), Nelson
patent: 6174599 (2001-01-01), Boire et al.
patent: 6362414 (2002-03-01), Fujisawa et al.

Affiliated with

Also associated with

Rating

Silica layers and antireflection film using same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silica layers and antireflection film using same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silica layers and antireflection film using same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3376965