Silica glass substrates and their selection

Details Silica glass substrates and their selection Silica glass substrates and their selection

2005-08-16

2005-08-16

Vincent, Sean (Department: 1731)

Glass manufacturing

Processes

With measuring, sensing, inspecting, indicating, or testing

C065S031000, C065S061000, C073S007000

Reexamination Certificate

active

06928837

ABSTRACT:
A silica glass substrate is obtained by polishing, cleaning, drying and etching a silica glass substrate slice. When the substrate on one surface is treated with a reactive reagent, defects having a size of at least 0.3 μm in a direction parallel to the substrate major surface are absent on the substrate surface. The silica glass substrate, in which no submicron defects manifest on the substrate surface even when treated as by cleaning or etching, serves as a reticle for use in photolithographic IC fabrication, achieving an improved manufacturing yield in the semiconductor device fabrication and microelectronic system fields.

REFERENCES:
patent: 4274907 (1981-06-01), Vig et al.
patent: H532 (1988-10-01), Brandmayr
patent: 0 629 588 (1994-12-01), None
patent: 11335140 (1999-12-01), None
patent: 2000302482 (2000-10-01), None
Machine Translation of JP 2000-302482 prepared at http://www.ipdl.jpo.go.jp.
Takeuchi et al. “Properties of our developing next generation photomask substrate” Database accession No. 6584331, abstract. Photomask and X-Ray Mask technology VI, Yokohama, Japan, Apr. 13-14, 1999, vol. 3748, pp. 41-52.
Phase Shift Mask Fabrication Using Reactive Ion Etching of Quartz Substrates Research Disclosure, Kenneth Mason Publications, Hampshire, GB, No. 340, Aug. 1, 1992, p. 682. abstract.

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