Silica glass member for UV-lithography, method for silica glass

Details Silica glass member for UV-lithography, method for silica glass Silica glass member for UV-lithography, method for silica glass

1996-09-06

1998-02-17

Henry, Jon W.

Optical: systems and elements

Having significant infrared or ultraviolet property

Lens, lens system or component

359350, 65413, 65 171, 501 53, 501905, G02B 1314, C03C 304, C03C 400, C03C 804

Patent

active

057196982

ABSTRACT:
Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.

REFERENCES:
patent: 4378953 (1983-04-01), Winn
patent: 4977426 (1990-12-01), Hirose
patent: 5028947 (1991-07-01), Yamada et al.
patent: 5031977 (1991-07-01), Gibson
patent: 5086352 (1992-02-01), Yamagata et al.
patent: 5212588 (1993-05-01), Viswanathan et al.
patent: 5287427 (1994-02-01), Atkins et al.
V.S. Khotimchenko et al, Zhurnal Prikladnoi Spektroskopii, "Determining the Content of Hydrogen Dissolved in Quartz Glass Using the Methods of Raman Scattering and Mass Spectrometry", Jun., 1987, vol. 46, No. 6, pp. 987-991 .

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