Optical: systems and elements – Having significant infrared or ultraviolet property
Patent
1996-05-16
1997-12-09
Dzierzynski, Paul M.
Optical: systems and elements
Having significant infrared or ultraviolet property
359355, 65 301, G02B 1314
Patent
active
056966245
ABSTRACT:
Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of silica glass, instead of the secondary treatment for hydrogen introduction.
REFERENCES:
patent: 5325230 (1994-06-01), Yamagata et al.
patent: 5616159 (1997-04-01), Araujo et al.
Fujiwara Seishi
Hiraiwa Hiroyuki
Jinbo Hiroki
Komine Norio
Dzierzynski Paul M.
Nikon Corporation
Schuberg Darren E.
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