Optical: systems and elements – Having significant infrared or ultraviolet property – Lens – lens system or component
Patent
1995-06-07
1997-12-16
Dzierzynski, Paul M.
Optical: systems and elements
Having significant infrared or ultraviolet property
Lens, lens system or component
359900, 355 53, G02B 1314, G03B 2742
Patent
active
056991835
ABSTRACT:
Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.
REFERENCES:
patent: 4378953 (1983-04-01), Winn
patent: 4730900 (1988-03-01), Uehara et al.
patent: 5028947 (1991-07-01), Yamada et al.
patent: 5028967 (1991-07-01), Yamada et al.
patent: 5031977 (1991-07-01), Gibson
patent: 5086352 (1992-02-01), Yamagata et al.
patent: 5212588 (1993-05-01), Viswanathan et al.
patent: 5364433 (1994-11-01), Nishimura et al.
patent: 5410428 (1995-04-01), Yamagata et al.
Fujiwara Seishi
Hiraiwa Hiroyuki
Jinbo Hiroki
Komine Norio
Nakagawa Kazuhiro
Dzierzynski Paul M.
Jr. John Juba
Nikon Corporation
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