Silica glass member for UV-lithography, method for silica glass

Details Silica glass member for UV-lithography, method for silica glass Silica glass member for UV-lithography, method for silica glass

1995-06-07

1997-12-30

Czaja, Donald E.

Glass manufacturing

Processes

65 174, 65421, 65531, C03B 2000

Patent

active

057024952

ABSTRACT:
Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. A silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.

REFERENCES:
patent: 3791714 (1974-02-01), Maurer
patent: 4251251 (1981-02-01), Blankenship
patent: 4263031 (1981-04-01), Schultz
patent: 4363647 (1982-12-01), Bachman et al.
patent: 4604118 (1986-08-01), Bocko et al.
patent: 5017209 (1991-05-01), Yoshimura
patent: 5086352 (1992-02-01), Yamagata et al.
patent: 5364428 (1994-11-01), Kyoto et al.
Database JPO, Automated Patent System, US Patent and Trademark Office: Patent Abstracts of Japan, Class C03B, JP 05-330831, Edakawa et al., abstract Mar. 1994.

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