Silica glass containing TiO 2 and process for its production

Details Silica glass containing TiO 2 and process for its production Silica glass containing TiO 2 and process for its production

2005-07-05

2008-08-12

Green, Anthony J (Department: 1793)

Compositions: ceramic

Ceramic compositions

Glass compositions, compositions containing glass other than...

C501S055000

Reexamination Certificate

active

07410922

ABSTRACT:
A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., an OH group concentration of at most 600 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.

REFERENCES:
patent: 2326059 (1943-08-01), Nordberg
patent: 5970751 (1999-10-01), Maxon et al.
patent: 6143676 (2000-11-01), Ohashi et al.
patent: 6465272 (2002-10-01), Davis et al.
patent: 6576380 (2003-06-01), Davis et al.
patent: 2002/0157421 (2002-10-01), Ackerman et al.
patent: 2005/0245382 (2005-11-01), Iwahashi et al.
patent: 0 401 845 (1990-12-01), None
patent: 60-176945 (1985-09-01), None
patent: WO99/15468 (1999-04-01), None
U.S. Appl. No. 11/589,875, filed Oct. 31, 2006, Koike, et al.
U.S. Appl. No. 11/172,872, filed Jul. 5, 2005, Iwahashi, et al.
U.S. Appl. No. 11/174,533, filed Jul. 6, 2005, Iwahashi, et al.
U.S. Appl. No. 11/172,950, filed Jul. 5, 2002, Iwahashi, et al.
U.S. Appl. No. 11/435,887, filed May 18, 2006, Iwahashi, et al.
Hayashi, et al., “The Development of Synthetic Silica Glass by VAD Method”, Sumitomo Metals Technical Magazine, vol. 43, No. 3, pp. 27-38. 1990. (w/partial English translation), no month.
Hayashi, et al., “The Development of Synthetic Silica Glass by VAD Method”, Sumitomo Metals Technical Magazine, vol. 42, No. 3, pp. 27-38. 1990, no month.
Copley, et al., “The influence of titania upon the thermal expansion of vitreous silica”, Physics and Chemistry of Glasses, vol. 14, No. 4 (1973), pp. 73-76, no month.
Schultz, et al., “Ultra-low-Expansion Glasses and Their Structure in the SiO2-TiO2 System”, Amorphous Materials, P.W. Douglas and Brian Ellis, Ed.s., (John Wiley and Sons Ltd, 1972), pp. 111-119, no month.
Sakaguchi, et al., “Rayleigh Scattering of silica glass and Silica Fibers with heat treatment”, Proc. Int. Workshop on Silica Glasses, Jpn. J. Appl. Phys. vol. 37, (1998), Suppl. 37-1, pp. 56-58, no month.
Corning Code 971 Glass Bulletin [Date = 12-90-2000], pp. 59-78.
Shelby, “Introduction to Glass Science and Technology, 2ndEd.,” (Royal Society of Chemistry, Cambridge, U.K., 2005), pp. 1-6 and 131-133 (Section 7), no month.
J. F. Shackelford, et al., J. Amer. Ceramic Soc., vol. 53, (1970), p. 417, no month.

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