Silica glass containing TiO 2 and process for its production

Compositions: ceramic – Ceramic compositions – Glass compositions – compositions containing glass other than...

Reexamination Certificate

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C501S055000, C501S057000

Reexamination Certificate

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07419924

ABSTRACT:
It is to provide a silica glass containing TiO2, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero.A silica glass containing TiO2, which has a TiO2concentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ti3+concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient of thermal expansion from 0 to 100° C. of 0±150 ppb/° C., and an internal transmittance T400-700per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.

REFERENCES:
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patent: 2002/0157421 (2002-10-01), Ackerman et al.
patent: 2005/0245382 (2005-11-01), Iwahashi et al.
patent: 2005/0245383 (2005-11-01), Iwahashi et al.
patent: 2005/0272590 (2005-12-01), Iwahashi et al.
patent: 2007/0042893 (2007-02-01), Koike et al.
patent: 60-176945 (1985-09-01), None
patent: WO 2004/089838 (2004-10-01), None
patent: WO 2004/089839 (2004-10-01), None
U.S. Appl. No. 11/589,875, filed Oct. 31, 2006, Koike, et al.
U.S. Appl. No. 11/435,887, filed May 18, 2006, Iwahashi, et al.
U.S. Appl. No. 11/957,855, filed Dec. 17, 2007, Iwahashi, et al.

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