Silica glass containing TiO 2 and process for its production

Details Silica glass containing TiO 2 and process for its production Silica glass containing TiO 2 and process for its production

2008-09-30

2008-09-30

Green, Anthony J (Department: 1793)

Compositions: ceramic

Ceramic compositions

Glass compositions, compositions containing glass other than...

C501S053000, C501S056000, C501S057000, C065S017400, C065S391000, C250S50400H, C359S350000

Reexamination Certificate

active

11172950

ABSTRACT:
A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

REFERENCES:
patent: 2326059 (1943-08-01), Nordberg
patent: 5970751 (1999-10-01), Maxon et al.
patent: 6465272 (2002-10-01), Davis et al.
patent: 6576380 (2003-06-01), Davis et al.
patent: 2002/0157421 (2002-10-01), Ackerman et al.
patent: 2004/0025542 (2004-02-01), Ball et al.
patent: 2005/0272590 (2005-12-01), Iwahashi et al.
patent: 0 582 070 (1994-02-01), None
patent: 1 281 679 (2003-02-01), None
patent: 1 281 680 (2003-02-01), None
patent: 60176945 (1985-09-01), None
patent: WO99/15468 (1999-04-01), None
U.S. Appl. No. 11/172,872, filed Jul. 5, 2005, Iwahashi et al.
U.S. Appl. No. 11/174,533, filed Jul. 6, 2005, Iwahashi et al.
U.S. Appl. No. 11/172,950, filed Jul. 5, 2002, Iwahashi et al.
U.S. Appl. No. 11/435,887, filed May 18, 2006, Iwahashi et al.
U.S. Appl. No. 11/589,875, filed Oct. 31, 2006, Koike et al.

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