Glass manufacturing – Processes – With chemically reactive treatment of glass preform
Patent
1998-05-18
1999-11-16
Silverman, Stanley S.
Glass manufacturing
Processes
With chemically reactive treatment of glass preform
65 321, 65 332, 65424, 65425, C03B 3700, C03B 27012, C03B 37018, C03B 3701
Patent
active
059836733
ABSTRACT:
A process of manufacturing a silica glass article comprising the steps of: (1) irradiating a silica glass article with electromagnetic waves to generate defects therein; and (2) immersing the thus irradiated silica glass article in an atmosphere comprising a hydrogen gas, thereby providing the resulting silica glass article with a characteristic that is effective for preventing it substantially from increasing its absorption within an ultraviolet region due to ultraviolet ray irradiation. Also disclosed are a silica glass article or a glass fiber produced according to the manufacturing process.
REFERENCES:
patent: 5325230 (1994-06-01), Yamagata et al.
patent: 5574820 (1996-11-01), Griscom
patent: 5616159 (1997-04-01), Araujo et al.
patent: 5668067 (1997-09-01), Araujo et al.
patent: 5679125 (1997-10-01), Hiraiwa et al.
Patent Abstracts of Japan, vol. 018, No. 078 (P-1689), Feb. 8, 1994 & JP 05288942 A (Fujikural Ltd), Nov. 5, 1993.
Patent Abstracts of Japan, vol. 096, No. 003, Mar. 29,1996 & JP 07 3003025 A (Shinetsu Quartz Prod Co Ltd), Nov. 14, 1995.
Patent Abstracts of Japan, vol. 017, No. 533 (C-1114), Sept. 27, 1993 & JP 05 147966A (Shin Etsu Chem Co Ltd; Others: 01), Jun. 15, 1999.
Patents Abstracts of Japan, vol. 018, No. 219 (C-1192), Apr. 20, 1994 & JP 06 016449 A (Shinetsu Quartz Prod Co Ltd), Jan. 25, 1994.
Patents Abstracts of Japan, vol. 009, No. 233 (C-304), Sept. 19, 1985 & JP 60 090853 A (Fukukawa Denki Kogyo KK; Others:01), May. 22, 1993.
Patents Abstacts of Japan, vol. 017, No. 321 (C-1072), Jun 18, 1993 & JP 05 0324324 A (Shinestsu Quartz Prod Co Ltd), Feb. 9, 1993.
Database Compendex Engineering Information, Inc., New York, NY US Nagasawa et al: "Improvemnt of Radiation Resistance of Optical Fibers With Hydrogen And gamma-Ray Irradiation Treatments"XP002102769 abstract & Proceedings of the Eighteent Symposium on Electrical Insulating Materias, Tokyo, JPN, 1985, pp. 321-324, Proceeding of the Syposium on Electrical Insulting Materials 18.sub.th 1985 Inst of Electrical Engineers of Japan, Tokyo, Jpn.
Tohmon, et al., "Resistance to Radiation Damage in Optical Fibers Treated with Hydrogen and X-ray Irradiated".
Danzuka Toshio
Kyoto Michihisa
Mogi Masaharu
Saito Tatsuhiko
Shishido Yasuhiko
Ruller Jacqueline A.
Silverman Stanley S.
Sumitomo Electric Industries Ltd.
LandOfFree
Silica glass article and manufacturing process therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Silica glass article and manufacturing process therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silica glass article and manufacturing process therefor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1309838