Silica films and method of production thereof

Coating processes – With post-treatment of coating or coating material – Solvent vapor treatment of coating

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S005000, C427S165000, C427S226000, C427S299000, C427S372200, C427S376200, C427S377000, C427S397700, C427S419200, C427S428200, C427S429000, C427S430100, C428S312600, C428S446000

Reexamination Certificate

active

07919145

ABSTRACT:
A method of producing a silica coating by forming a silica precursor formulation that is coated on a substrate as a continuous liquid phase. The silica precursor formulation is then cured in an ammoniacal atmosphere to produce a continuous, interconnected, nano-porous silica network.

REFERENCES:
patent: 3922392 (1975-11-01), Kohlschutter et al.
patent: 5639517 (1997-06-01), Floch et al.
patent: 5698266 (1997-12-01), Floch et al.
patent: 6099911 (2000-08-01), Yano et al.
patent: 6291697 (2001-09-01), Tanaka et al.
patent: 6316572 (2001-11-01), Nambu et al.
patent: 6403183 (2002-06-01), Iwamiya et al.
patent: 6511721 (2003-01-01), Murata et al.
patent: 6599976 (2003-07-01), Kobayashi et al.
patent: 6610145 (2003-08-01), Hendricks et al.
patent: 2002/0041932 (2002-04-01), Ogawa
patent: 2004/0028915 (2004-02-01), Shibuya et al.
patent: 2004/0048960 (2004-03-01), Peterson et al.
patent: 834488 (1998-04-01), None
patent: 1074859 (2001-02-01), None
patent: 04-180977 (1992-06-01), None
patent: 08-120225 (1996-05-01), None
patent: 10-226767 (1998-08-01), None
patent: 10-316934 (1998-12-01), None
patent: WO 94/23315 (1994-10-01), None
ColCoat Co Ltd. fact sheet printed from the website of said company.
Ishino et al., “Mass production of hydrophobic silica aerogel and readout optics of Cherenkov light”, Nuclear Instruments and Methods in Physics Research A 457 (2001) pp. 581-587.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Silica films and method of production thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silica films and method of production thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silica films and method of production thereof will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2733481

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.