Silica by precipitation at constant alkali number, and its use

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C423S338000, C423S339000, C424S049000, C424S401000, C502S232000, C502S439000, C106S286800, C106S287340

Reexamination Certificate

active

07871588

ABSTRACT:
Precipitated silica or silicates, obtainable by acid precipitation of aqueous silicate solutions while maintaining a constant alkali number of at least 1.

REFERENCES:
patent: 4001379 (1977-01-01), Turk et al.
patent: 5871867 (1999-02-01), Rausch et al.
patent: 6107226 (2000-08-01), Chevallier
patent: 6960251 (2005-11-01), Uhrlandt et al.
patent: 7097818 (2006-08-01), Lindner et al.
patent: 2001/0051176 (2001-12-01), Viot
patent: 2003/0003040 (2003-01-01), Lindner et al.
patent: 2006/0017038 (2006-01-01), Hasenzahl et al.
patent: 2006/0229210 (2006-10-01), Neugebauer et al.
patent: 0 754 650 (1997-01-01), None
patent: 0 755 899 (1997-01-01), None
patent: 0 901 986 (1999-03-01), None
patent: 937755 (1999-08-01), None
patent: WO 99/07237 (1999-02-01), None
U.S. Appl. No. 11/624,982, filed Jan. 19, 2007, Heindl, et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Silica by precipitation at constant alkali number, and its use does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silica by precipitation at constant alkali number, and its use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silica by precipitation at constant alkali number, and its use will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2731448

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.