Silica

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

Reexamination Certificate

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C423S335000

Reexamination Certificate

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07101523

ABSTRACT:
Silica with a large pore volume, a large specific surface area, a narrow pore distribution, low contents of unwanted metal impurities, and excellent physical properties such as high heat-resistance and water-resistance is provided. The silica has a mode pore diameter (Dmax) of 20 nm or less, and a solid-state Si nuclear magnetic resonance (hereinafter called solid-state Si NMR) spectrum of the silica includes a chemical shift (δ ppm) of Q4peak meeting the following inequality (I).in-line-formulae description="In-line Formulae" end="lead"?−0.0705×(Dmax)−110.36>δ  (I)in-line-formulae description="In-line Formulae" end="tail"?The silica with such properties can be suitably used in fields of which particularly excellent heat resistance and water resistance are required, and moreover controlled pore properties, and the fact that physical properties scarcely change over a long period of time are required among the above-mentioned applications.

REFERENCES:
patent: 5307821 (1994-05-01), Misuda et al.
patent: 5750258 (1998-05-01), Sakai et al.
patent: 6838068 (2005-01-01), Katsuro et al.
patent: 2002/0018743 (2002-02-01), Katsuro et al.
patent: 0 653 378 (1995-05-01), None
patent: 0653378 (1995-05-01), None
patent: 62-113713 (1987-05-01), None
patent: 09-30809 (1997-02-01), None
patent: 2000-281330 (2000-10-01), None
Seong Su Kim, et al., “Ultrastable Mesostructured Silica Vesicles” Science, (www.sciencemag.org) vol. 282, Nov. 13, 1998: pp. 1302-1305.
Chinese Office Action dated Mar. 5, 2004.

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