Silane purification process

Chemistry of inorganic compounds – Silicon or compound thereof – Binary compound

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423210, 423299, 436103, 436182, C01B 3304

Patent

active

045321205

ABSTRACT:
A process for the removal of and analysis of phosphine and arsine impurities in silane gas. Silane gas which normally contains the impurities of AsH.sub.3 and PH.sub.3 is contacted with a solution of NaAlH.sub.4 in dimethoxyethane, other ether or amine to remove the impurities therefrom. The dimethoxyethane or other ether solution may then be hydrolyzed with water or alcohol to evolve hydrogen gas from the NaAlH.sub.4 and to re-evolve phosphine and arsine which may then be quantitatively determined by gas chromatography, atomic absorption, or other means.

REFERENCES:
patent: 2971607 (1961-02-01), Caswell
patent: 2987139 (1961-06-01), Bush
patent: 3041141 (1962-06-01), Shoemaker et al.
patent: 3043664 (1962-07-01), Mason et al.
patent: 3446605 (1969-05-01), Finholt
patent: 3512932 (1970-05-01), Stern et al.
Preparation of High-Purity Silicon from Silane, Charles H. Lewis et al.
1961, J. Electrochemical Society, Lewis et al.

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