Silane monomers and siloxane polymers for semiconductor...

Details Silane monomers and siloxane polymers for semiconductor... Silane monomers and siloxane polymers for semiconductor...

2011-06-07

2011-06-07

Moore, Margaret G (Department: 1765)

Coating processes

With post-treatment of coating or coating material

Heating or drying

C528S035000, C428S447000

Reexamination Certificate

active

07955660

ABSTRACT:
A method for producing a polymer for semiconductor optoelectronics, comprising the steps of providing a monomer is produced having the formula:wherein:R1is a hydrolysable groupR2is hydrogen, andR3is a bridging linear or branched bivalent hydrocarbyl group,said monomer being produced by hydrosilylation of the corresponding starting materials, and homo- or copolymerizing the monomer to produce a polymer.

REFERENCES:
patent: 5188903 (1993-02-01), Liao et al.
patent: 6271406 (2001-08-01), Abele et al.
patent: 6465368 (2002-10-01), Inoue et al.
patent: 6800133 (2004-10-01), Kim et al.
patent: 2003/0216058 (2003-11-01), Ko et al.
patent: 2005/0194619 (2005-09-01), Edelstein et al.

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