Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system
Reexamination Certificate
2008-09-30
2008-09-30
Le, John H (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Electrical signal parameter measurement system
C356S616000, C250S306000, C702S106000
Reexamination Certificate
active
11396104
ABSTRACT:
An improved signal processing method and apparatus are presented for use in real-time sub-nanometer scale position measurements with the aid of probing sensors and/or beams scanning periodically undulating surfaces such as a grating and diffraction patterns generated thereby, and the like, enabling greater sub-nanometer precision, higher stage scanner movement speeds, and simultaneous high accuracy and top speed measuring capabilities.
REFERENCES:
patent: 5589686 (1996-12-01), Ohara
patent: 5744799 (1998-04-01), Ohara
patent: 6639686 (2003-10-01), Ohara
Le John H
Rines and Rines
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