Drying and gas or vapor contact with solids – Process – With contacting of material treated with solid or liquid agent
Patent
1998-12-17
2000-10-03
Yeung, James C.
Drying and gas or vapor contact with solids
Process
With contacting of material treated with solid or liquid agent
34576, 432 58, 432 15, F26B 300
Patent
active
061255521
ABSTRACT:
A fluid bed processing system in accordance with one embodiment of the present invention includes a product chamber, a fluid supply system, and a discharge gate. The product chamber has an open top and an open bottom and the fluid supply system has an outlet positioned to direct a first fluid into the product chamber. The outlet of the fluid supply system is spaced from the open bottom of the product chamber to define a discharge opening which extends substantially around the open bottom of the product chamber and the outlet of the fluid supply system. The discharge gate is movable to a first position covering the discharge opening and to a second position exposing the discharge opening.
REFERENCES:
patent: 3253750 (1966-05-01), Paton
patent: 3743539 (1973-07-01), Kroyer et al.
patent: 4045005 (1977-08-01), Davis et al.
patent: 4203689 (1980-05-01), Kraxner et al.
patent: 4320089 (1982-03-01), Huttlin
patent: 4338878 (1982-07-01), Mason et al.
patent: 4353668 (1982-10-01), Anderson
patent: 4354450 (1982-10-01), Nagahama et al.
patent: 4439072 (1984-03-01), Goedken
patent: 5009508 (1991-04-01), Wojdylo
patent: 5096096 (1992-03-01), Calaunan
patent: 5115578 (1992-05-01), Basten
Braun Ryszard
Kosola Antti
Uskonen Iiro
Genencor International Inc.
Yeung James C.
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