Active solid-state devices (e.g. – transistors – solid-state diode – Specified wide band gap semiconductor material other than... – Diamond or silicon carbide
Reexamination Certificate
2009-05-20
2011-10-25
Richards, N Drew (Department: 2895)
Active solid-state devices (e.g., transistors, solid-state diode
Specified wide band gap semiconductor material other than...
Diamond or silicon carbide
C257S070000, C257S076000, C257S094000, C257S096000, C257S098000
Reexamination Certificate
active
08044408
ABSTRACT:
The invention provides a high-quality SiC single-crystal substrate, a seed crystal for producing the high-quality SiC single-crystal substrate, and a method of producing the high-quality SiC single-crystal substrate, which enable improvement of device yield and stability. Provided is an SiC single-crystal substrate wherein, when the SiC single-crystal substrate is divided into 5-mm square regions, such regions in which dislocation pairs or dislocation rows having intervals between their dislocation end positions of 5 μm or less are present among the dislocations that have ends at the substrate surface account for 50% or less of all such regions within the substrate surface and the dislocation density in the substrate of dislocations other than the dislocation pairs or dislocation is 8,000/cm2.
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Yu. M. Tairov et al., “General Principles of Growing Large-Size Single Crystals of Various Silicon Carbide Polytypes”, Journal Crystal Growth, vol. 52 (1981), pp. 146-150.
Kazuyuki Koga et al., “SiC Blue Light Emitting Diode”, p. 23-29, Paper of Electronic Material Committee, No. EFM-88-24-P24, The Institute of Electrical Engineering of Japan, (1988).
Fujimoto Tatsuo
Hirano Housei
Hoshino Taizo
Katsuno Masakazu
Nakabayashi Masashi
Birch & Stewart Kolasch & Birch, LLP
Lee Kyoung
Nippon Steel Corporation
Richards N Drew
LandOfFree
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