SiC single-crystal substrate and method of producing SiC...

Active solid-state devices (e.g. – transistors – solid-state diode – Specified wide band gap semiconductor material other than... – Diamond or silicon carbide

Reexamination Certificate

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Details

C257S070000, C257S076000, C257S094000, C257S096000, C257S098000

Reexamination Certificate

active

08044408

ABSTRACT:
The invention provides a high-quality SiC single-crystal substrate, a seed crystal for producing the high-quality SiC single-crystal substrate, and a method of producing the high-quality SiC single-crystal substrate, which enable improvement of device yield and stability. Provided is an SiC single-crystal substrate wherein, when the SiC single-crystal substrate is divided into 5-mm square regions, such regions in which dislocation pairs or dislocation rows having intervals between their dislocation end positions of 5 μm or less are present among the dislocations that have ends at the substrate surface account for 50% or less of all such regions within the substrate surface and the dislocation density in the substrate of dislocations other than the dislocation pairs or dislocation is 8,000/cm2.

REFERENCES:
patent: 2008/0237609 (2008-10-01), Powell et al.
patent: 05-262599 (1993-10-01), None
patent: 08-143396 (1996-06-01), None
patent: 2003-119097 (2003-04-01), None
Yu. M. Tairov et al., “General Principles of Growing Large-Size Single Crystals of Various Silicon Carbide Polytypes”, Journal Crystal Growth, vol. 52 (1981), pp. 146-150.
Kazuyuki Koga et al., “SiC Blue Light Emitting Diode”, p. 23-29, Paper of Electronic Material Committee, No. EFM-88-24-P24, The Institute of Electrical Engineering of Japan, (1988).

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