Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state
Patent
1997-05-14
1999-09-28
Kunemund, Robert
Single-crystal, oriented-crystal, and epitaxy growth processes;
Forming from vapor or gaseous state
117 87, 117109, 117951, 148DIG148, C30B 2306
Patent
active
059581328
ABSTRACT:
A method for the growth of a SiC single crystal comprising
REFERENCES:
patent: 2854364 (1958-09-01), Lely
patent: 3634149 (1972-01-01), Knippenberg
patent: 4556436 (1985-12-01), Addamiano
patent: 4866005 (1989-09-01), Davis et al.
patent: 5011549 (1991-04-01), Kong et al.
patent: 5200022 (1993-04-01), Kong et al.
Tairov et al. "General Principles of Growing Large-Size Single Crystals of Various Silicon Carbide Polytypes", Jour. of Crystal Growth vol. 52 (1981) pp. 146-150.
Koga et al., Single Crystal Growth of 6H-SiC by a Vacuum Sublimation Method, Ext. ABS. of the 17.sup.th Conf. on Solid State Materials 1985 pp. 249-252.
Data EFM-88-24, p. 24, published by Electric Science Society (Japan), Electronic Material Study Group, on Sep. 5, 1988.
Tairov et al., Journal of Crystal Growth, 36, 147-151 (1976).
Tairov et al., Journal of Crystal Growth, 43, 209-212 (1978).
Tairov et al., Journal of Crystal Growth, 52, 146-150 (1981).
Koga et al., Vacuum, 30(11), 886-892.
Koga et al., Extended Abstracts of the 17th Conference on Solid State Devices and Materials, Tokyo, pp. 249-252 (1985).
Fujiwara Yuichiro
Kanaya Masatoshi
Ohtani Noboru
Takahashi Jun
Kunemund Robert
Nippon Steel Corporation
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