Si x Sn y Ge 1-x-y and related alloy heterostructures based...

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

Reexamination Certificate

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C257S019000, C257S201000, C257S616000, C257SE31035, C257SE33009, C438S285000, C438S936000, C117S939000, C148SDIG016

Reexamination Certificate

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07598513

ABSTRACT:
A novel method for synthesizing device-quality alloys and ordered phases in a Si—Ge—Sn system uses a UHV-CVD process and reactions of SnD4with SiH3GeH3. Using the method, single-phase SixSnyGe1-x-ysemiconductors (x≦0.25, y≦0.11) are grown on Si via Ge1-xSnxbuffer layers The Ge1-xSnxbuffer layers facilitate heteroepitaxial growth of the SixSnyGe1-x-yfilms and act as compliant templates that can conform structurally and absorb the differential strain imposed by the more rigid Si and Si—Ge—Sn materials. The SiH3GeH3species was prepared using a new and high yield method that provided high purity semiconductor grade material.

REFERENCES:
patent: 4769341 (1988-09-01), Luryi
patent: 4777023 (1988-10-01), Fieselmann
patent: 5198387 (1993-03-01), Tang
patent: 5532183 (1996-07-01), Sugawara
patent: 5548128 (1996-08-01), Soref et al.
patent: 5714415 (1998-02-01), Oguro
patent: 6410434 (2002-06-01), Mani
patent: 6441716 (2002-08-01), Doppalapudi et al.
patent: 6723621 (2004-04-01), Cardone et al.
patent: 6888175 (2005-05-01), Wang et al.
patent: 6897471 (2005-05-01), Soref et al.
patent: 6911084 (2005-06-01), Kouvetakis et al.
patent: 2003/0157787 (2003-08-01), Murthy et al.
patent: 2005/0070053 (2005-03-01), Sadaka et al.
patent: 2006/0134895 (2006-06-01), Kouvetakis et al.
patent: 2006/0236923 (2006-10-01), Kouvetakis et al.
patent: 63108782 (1988-05-01), None
patent: WO 03/033781 (2003-04-01), None
patent: WO 2004/114368 (2004-12-01), None
patent: WO 2005/001902 (2005-01-01), None
patent: WO 2005/015609 (2005-02-01), None
patent: WO 2006/009171 (2006-01-01), None
D. W. Jenkins, “Electronic properties of metastable GexSn1-x alloys”, Phys. Rev. B., vol. 36, pp. 7994-8001 (1987).
K. A. Mader, “Band structure and instability of GexSn1-x alloys”, Solid State Commun., vol. 69(12), pp 1123-1126 (1989).
G. He and H.A. Atwater, “Interband transitions in SnxGel1-xAlloys”, Phys. Rev. Lett., vol. 79(10), pp. 1937-1940 (1997).
O. Gurdal, R. Desjardins, J. R. A. Carlsson, N. Taylor, H. H. Radamson, J.-E. Sundgren, and J. E. Greene, “Low-temperature growth and critical epitaxial thicknesses of fully strained metastable Ge1-x Snx (x ≦0.26) alloys”, J. Appl. Phys., vol. 83(1), pp. 162-170 (1998).
M. T. Asom, E. A. Fitzgerald, A. R. Kortan, B. Spear, and L. C. Kimerling, “Epitaxial Growth of SnGe Alloys”, Appl. Phys. Lett., vol. 55(6), pp. 578-580 (1989).
H. Höchst, M. A. Engelhardt, and D. W. Niles, “The MBE growth and electronic structure ofa-SnxGe1-xalloys”, SPIE Proceedings, vol. 1106, pp. 165-171 (1989)(Abstract).
C. A. Hoffman, et al., “Three-Band transport and cyclotron resonance in alpha—Sn and alpha—Sn1-xGexgrown by molecular-beam epitaxy”, Phys. Rev. B. vol. 40(17): pp. 11693-11700, (1989).
W. Wegscheider, K. Eberl, U. Menczigar, and G. Abstreiter, “Single-crystal Sn/Ge superlattices on Ge substrates: Growth and structural properties”, Appl. Phys. Lett., vol. 57(9), pp. 875-877 (1990).
O. Gurdal, et al., “Growth of metastable Ge1-xSnx/Ge stratined layer superlattices on Ge(001)2×1 by temperature-modulated molecular beam epitaxy”, Appl. Phys. Lett., vol. 67(7), pp. 956-958 (1995).
P. R. Pukite, A. Harwit, and S. S. Iyer, “Molecular beam epitaxy of metastable, diamond structure SnxGe1-xalloys”, Appl. Phys. Lett. 54(21), pp. 2142-2144 (1989).
M. Bauer, et al., “Ge-Sn semiconductors for band-gap and lattice engineering”, Appl. Phys. Lett. 81(16), pp. 2992-2994 (2002).
L. Bellaiche, S.-H. Wei and Z. Zunger, “Localization and percolation in semiconductor alloys: GaAsN vs GaAsP”, Phys. Rev. B 54, 17568-17576 (1996).
J. Taraci, J. Tolle, M. R. M. Cartney, J. Menendez, M. A. Santana, D. J. Smith, and J. Kouvetakis, “Simple chemical routes to diamond-cubic germanium-tin alloys”, App. Phys. Lett. 78(23), pp. 3607-3609 (2001).
J. Taraci, S. Zollner, M. R. McCartney, J. Menéndez, M. A. Santana, D. J. Smith, A. Haaland, A. V. Tutukin, G. Gundersen, G. Wolf, and J. Kouvetakis, “Synthesis of silicon-based infrared semiconductors in the Ge-Sn system using molecular chemistry methods”, J. of the Am. Chem. Soc., Col: 123(44), pp. 10980-10987 (2001).
V. Atluri, N. Herbots, D. Dagel, H. Jacobsson, M. Johnson, R. Carpio, and B. Fowler, “Comparison and reproducibility of H-passivation of Si(1000) with HF in methanol, ethanol, isopropanol and water by IBA, TMAFM, and FTIR”, Mater. Res. Soc. Symp. Proc. 477, pp. 281-292 (1997) (Abstract).
Z. Charafi and N. Bouarissa, “The effect of the violation of Vegard's law on the optical bowing in Si1-xGexalloys”, Phys. Lett. A. vol. 234, pp. 493-497 (1997).
H. Kajiyama, S-I. Muramatsu, T. Shimada, and Y. Nishino, “Bond-length relaxation in crystalline Si1-xGexalloys: An extended x-ray-absorption fine-structure study”, Phys. Rev. B vol. 45(24), pp. 14005-14010 (1992).
F. Cerdeira, W. Dreyrodt, and M. Cardona, “Resonant raman scattering in germanium”, Solid State Commun., vol. 10, 591-595 (1972).
M.M. McGibbon, N. D. Browning, M.F. Chisholm, A.J. McGibbon, S.J. Pennycook, V. Ravikumar, V.P. Dravid, “Direct determination of grain boundary atomic structure in SrTio3” Science, vol. 266, pp. 102-104 (1994).
P. Mock, T. Topuria, N. D. Browning, G. R. Booker, N. J. Mason, R. J. Nicholas, M. Dobrowolska, S. Lee, and J. K. Furdyna, “Internal self-ordering in In(Sb,As), (In,Ga) Sb, and (Cd,Zn,Mn) Se nano-agglomerates/quantum dots”, Appl. Phys. Lett., vol. 79(7), pp. 946-948. (2001).
D.M. Ceperley, B.J. Alder, “Ground State of the Electron Gas by Stochastic Method”, Phys. Rev. Lett., vol. 45, pp. 566-569 (1980).
T G. Kresse and J. Hafner, “Ab initio molecular dynamics for liquid metals”, Phys. Rev. B47(1), pp. R558-561 (1993).
G. Kresse and J. Hafner, “Ab ignition molecular-dynamics simulation of the liquid-metal-amorphous-semiconductor transition in germanium”, Phys. Rev. B49(20), pp. 14251-14269 (1994).
G. Kresse, J. Furthmuller, “Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set”, Comput. Mater. Sci. vol. 6, pp. 15-50 (1996).
G. Kresse, J. Furthmuller, “Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set”, Phys. Rev. B54(16), pp. 11169-11186 (1996).
R. A. Soref and L. Friedman, “Direct-gap Ge/GeSn/Si and GeSn/Ge/Si heterostructures”, Superlattices and Microstructures, vol. 14(2), 189-193 (1993).
M. R. Bauer, J. Kouvetakis, D.J. Smith and J. Menendez, “Tunable band structure in diamond cubic tin germanium alloys grown on Si”, Solid State Commun., vol. 127, 355-359 (2003).
M.R. Bauer, P. Crozier, A.V.G Chizmeshya and J. D. Smith and J. Kouvetakis, “GeSn superstructured materials for Si-based optoelectronics”, Appl. Phys. Lett. vol. 83, pp. 3489-3491 (2003).
M. Bauer et al., “Tunable band structure in diamond-cubic tin-germanium alloys grown on silicon substrates”, Solid State Communications, vol. 127 (2003), pp. 355-359.
S. Cradock, E. A. V. Ebsorth, G. Davidson, L. A. Woodard, “Studies in Germyl Chemistry.3. Trigermylphosphine”, J. Chem. Soc. A, 8, pp. 1229-1233 (1967).
D. W. H. Rankin, A. G. E. Robiet, G. M. Sheldrick, 5 Beagley, T. G. Hewit, “An electron Diffraction of the Molecular Structures of Trigermylphosphine and Trisilylstibine in the Gas Phase” J. Inorg. Nucl. Chem., 31, pp. 2351-2357 (1969).
E. A. V. Ebsworth, D. J. Hutchison, D. W. H. Rankin, “The Preparation, properties, and Gas-Phase Molecular-Structure of 1,1- Difluoro-2,2-Digermylbiphosphone”,J. Chem. Res., Synop, 12, pp. 393, (1980).
E. A. V. Ebsworth, D. W. H. Rankin, G. M. Sheldrick, “Preparation and Properties of Trigermyl-arsine and—stibine”, J. Chem. Soc. A, 11, pp. 2828-2830 (

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