Shutter unit and laser processing device using same

Details Shutter unit and laser processing device using same Shutter unit and laser processing device using same

2004-11-04

2009-12-01

Phan, James (Department: 2872)

Optical: systems and elements

Light control by opaque element or medium movable in or...

With rotating or pivoting element

C359S230000, C359S234000

Reexamination Certificate

active

07626746

ABSTRACT:
A shutter unit capable of preventing the scattering of the laser beam upon closing the optical path of the laser beam and capable of being miniaturized, and a laser processing device employing such a shutter unit. In a shutter unit1, when the optical path of the laser beam L is opened, a rotating member57is rotated around an axis line γ, and an opening61is positioned on an optical axis α so as to pass the laser beam L therethrough. Meanwhile, when the optical path of the laser beam L is closed, the rotating member57is rotated and a reflective surface62is positioned on the optical axis α so as to reflect the laser beam L. Here, since the reflected laser beam L is absorbed by an optical absorption member63, it is possible to prevent the scattering of the laser beam L when the optical path of the laser beam L is closed. In addition, since the opening61and reflective surface62are both formed on the rotating member57which rotates around the axis line γ that is substantially orthogonal to the optical axis α, it is possible to reduce the size of the shutter unit1.

REFERENCES:
patent: 3574445 (1971-04-01), Harmon
patent: 3736402 (1973-05-01), Mefferd et al.
patent: 3931593 (1976-01-01), Marshall
patent: 4799767 (1989-01-01), Woodruff
patent: 4946256 (1990-08-01), Woodruff
patent: 5032005 (1991-07-01), Woodruff
patent: 57-042003 (1982-03-01), None
patent: 59-061587 (1984-04-01), None
patent: 01-191117 (1989-08-01), None
patent: 01-227119 (1989-09-01), None
patent: S63-145747 (1990-05-01), None
patent: 03-189086 (1991-08-01), None
patent: 07-193300 (1995-07-01), None
patent: 2683836 (1997-08-01), None
patent: 10-034368 (1998-02-01), None
patent: 2578868 (1998-05-01), None
patent: 3014755 (1999-12-01), None
patent: 2000-057817 (2000-02-01), None
patent: 2000-252551 (2000-09-01), None
patent: 3734812 (2005-10-01), None
K. Hayashi; “Inner Glass Marking by Harmonics of Solid-State Laser”, Proceedings of 45thLaser Materials Processing Conference, Dec. 1998, pp. 23-28.
K. Miura et al., “Formation of Photo-Induced Structures in Glasses with Femtosecond Laser”, Proceedings of 42ndLaser Materials Processing Conference, Nov. 1997, pp. 105-111.
T. Sano et al., “Evaluation of Processing Characteristics of Silicon with Picosecond Pulse Laser”, Preprints of the National Meeting of Japan Welding Society, No. 66, Apr. 2000, pp. 72-73 (with at least partial English translation).

Affiliated with

Also associated with

Rating

Shutter unit and laser processing device using same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Shutter unit and laser processing device using same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Shutter unit and laser processing device using same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4117915